病因、電極陣列類型與失聰期間對人工耳蝸使用者聚焦檢測閾值的影響

// The Effect of Etiology, Array Type and Duration of Deafness on Focused Detection Thresholds in Cochlear Implant Listeners

回顧性研究含74名成人、92耳人工耳蝸使用者，測定聚焦刺激閾值以評估電極—神經介面（ENI，electrode–neuron interface）｜前彎電極閾值較低且呈U形（端低中高），自體免疫病因如梅尼埃氏症呈相反模式；失聰持續時間無顯著影響｜結果顯示電極型式與病因影響ENI品質，能解釋術後表現差異並協助個人化治療與調整策略

// This retrospective study tested whether focused-stimulation absolute thresholds, as a behavioral estimate of the electrode–neuron interface (ENI), vary with patient and device factors by analyzing threshold patterns in 92 ears from 74 adult cochlear-implant users. Listeners with pre-curved arrays had lower overall thresholds and a U-shaped profile (lower thresholds at the ends, highest in the middle), while those with autoimmune-related etiologies (e.g., Meniere’s disease) showed the opposite pattern; duration of deafness had no effect. The findings indicate array type and etiology affect focused thresholds and thus ENI quality, which may help explain CI outcome variability and guide individualized treatment.

Published 2026年9月9日